The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 1996
Filed:
Mar. 29, 1995
William F Hug, Chino, CA (US);
Ray D Reid, Glendora, CA (US);
Omnichrome Corporation, Chino, CA (US);
Abstract
A system for rapidly producing an integrated circuit on a substrate using a curable liquid capable of solidification to form a photo-resist pattern corresponding to an artwork representation of interconnections when subjected to ultra-violet light energy operates with a processor and computer aided design software. The system includes an x-y table, an electronically erasable mask, a drawing device and a projecting system. The substrate is disposed on the x-y table. The curable liquid lies in a solidification plane on the substrate. The electronically erasable mask is an ultra-violet wavelength isolating image buffer and is electrically coupled to the processor. The drawing device may be a back lighted liquid crystal display or a high resolution cathode ray tube or an infrared diode laser raster scanner and electronically draws an image of the artwork representation for the interconnections onto the electronically erasable mask. The projecting system projects ultra-violet light energy onto the electronically erasable mask so that the electronically erasable mask transfers a single frame exposure of the image in order to reflect the ultra-violet light energy onto the curable liquid in the solidification plane thereby forming the photo-resist pattern on the substrate.