The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 1996

Filed:

Nov. 10, 1994
Applicant:
Inventors:

Yukio Kohmura, Chiba, JP;

Koichi Toyosaki, Kisarazu, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; F01D / ; F01D / ;
U.S. Cl.
CPC ...
118730 ; 118500 ; 4151221 ; 415202 ;
Abstract

A vapor phase growth system comprises a gas-drive motor including a ring-shaped stator and a rotor housed in a rotor chamber formed in the stator, and designed to rotate the rotor by injecting a gas toward gas receiving grooves in the peripheral surface of the rotor through injection ports which open in the peripheral surface of the rotor chamber. A rotating shaft of a susceptor rotating mechanism extends along the axis of a susceptor in a reactor, and has one end fixed to the top wall of the susceptor. A tray rotating shaft, having one end fixed to each of trays arranged individually in recesses in the outer surface of the susceptor, extends penetrating the peripheral wall of the susceptor. As a rotating shaft of a drive mechanism rotates, a wafer supported by each tray revolves around the rotating shaft. A gear fixed to the other end of the tray rotating shaft is in mesh with a ring gear on the upper end face of a hollow rotating member fixed to the upper surface of the rotor and located coaxially with the rotating shaft of the drive mechanism. As the rotor rotates, each tray is rotated by the tray rotating shaft gear-connected to the hollow rotating member, so that the wafer rotates around the tray rotating shaft. Accordingly, the speeds of rotation and revolution of the wafer can change independently of each other.


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