The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 1996
Filed:
Aug. 25, 1994
Applicant:
Inventors:
Assignee:
Shima Seiki Manufacturing Ltd., Wakayama, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09F / ; D04B / ;
U.S. Cl.
CPC ...
36447002 ; 66232 ; 66 752 ; 36447012 ;
Abstract
Each design data of intarsia, jacquard, and structural stitches is separately stored and independently processed. Each design data is stored in an internal data format where one pixel is allocated to each loop and is compensated for the aspect ratio of loops by affine transformation before being displayed on a monitor. Similarly input coordinates from a stylus are inputted in a coordinate system corresponding to the internal data format and then converted into monitor address with coordinate affine transformation.
Kotaki, Kenji. (1996). Knit design system and a method for designing knit fabrics (U.S. Patent No. 5557527). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5557527
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