The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 1996
Filed:
Jul. 22, 1994
George Wakalopulos, Pacific Palisades, CA (US);
American International Technologies, Inc., Torrance, CA (US);
Abstract
An electron beam device having a plurality of individual, electron permeable, gas impermeable windows can produce a broad beam of free electrons. A multiplicity of windows allows each of the windows to be stronger, yet thinner, for greater electron permeability and durability. Having multiple windows also allows each window to be formed as a single crystal film, which can have superior strength and electron permeability, and which is difficult to form in a large area and easy to damage when so formed. In addition, having multiple windows allows a window end of the device and the beam which exits from that end to have configurations not easily achieved with a single window. Should a pinhole develop in one of the windows, it may be possible to seal the pinhole and re-evacuate the device, thereby extending the lifetime of the device. A current monitor is used to determine whether the electron beam passes through the windows or is absorbed in a surrounding face plate. A microprocessor controls the intensity and direction of the beam, in combination with feedback from the current monitor, to direct the beam through the windows in a sequence.