The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 1996
Filed:
Oct. 31, 1995
Applicant:
Inventors:
Assignee:
Mitsubishi Chemical Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
562412 ; 562414 ; 562486 ;
Abstract
A process for preparing an aqueous slurry of terephthalic acid, which comprises oxidizing p-xylene with molecular oxygen in a liquid phase in an acetic acid solvent in the presence of a catalyst, to obtain an acetic acid slurry of terephthalic acid, separating terephthalic acid crystals from the acetic acid slurry, washing the terephthalic acid crystals containing acetic acid, with p-xylene or an acetic acid ester, and then mixing water thereto.
Quick Actions:
Izumisawa, Yoshiaki. (1996). Process for preparing an aqueous slurry of terephthalic acid (U.S. Patent No. 5557009). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5557009
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile