The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 1996

Filed:

Feb. 15, 1996
Applicant:
Inventors:

Maurice J Fitzgerald, Canton, MA (US);

Frederick R Kearney, Walpole, MA (US);

Rong-Chang Liang, Newton, MA (US);

William C Schwarzel, Billerica, MA (US);

Assignee:

Polaroid Corporation, Cambridge, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; G03F / ;
U.S. Cl.
CPC ...
525293 ; 525303 ; 525285 ; 525308 ; 4302841 ;
Abstract

A photoreactive binder that may be used to enhance photospeed in either conventional plates or on-press developable lithographic printing plates. Briefly, a polymer of m-isopropenyl-.alpha.,.alpha.-dimethylbenzyl isocyanate is derivatized for vinyl group reactivity by reacting the isocyanate groups thereof with hydroxyalkyl acrylate. The resulting photopolymeric binder provides significantly higher photospeed than the non-reactive binder currently utilized in the production of conventional printing plates. The resulting lithographic printing plate also shows better durability (as manifested by longer run-length) and is more easily developed by the microencapsulated developers utilized in the present invention. As to the preparation of the photoreactive binders, the application discloses a method of copolymerizing m-isopropenyl-.alpha.,.alpha.-dimethylbenzyl isocyanate (m-TMI) through complexation with an electron-deficient monomer such as maleic anhydride to accelerate free radical copolymerization with other monomers, and thus, provides greater monomer-to-polymer conversion. Use of the resulting product in the photoresist of a lithographic printing plate improves its adhesion to an underlying substrate.


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