The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 1996
Filed:
Apr. 25, 1995
Applicant:
Inventors:
Martin E Garnett, Los Gatos, CA (US);
Michael R Hsing, San Jose, CA (US);
Assignee:
Micrel, Inc., San Jose, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 31 ; 437 27 ; 437 59 ; 437 69 ; 437 75 ; 437148 ; 437984 ; 148D / ; 257370 ;
Abstract
A method in accordance with one embodiment of the present invention may be used to self-align isolation regions, sinkers, and wells. In this improved method, P+ isolation regions, N+ sinkers, and P-wells are defined using the same masking step used to define the N-wells. The use of a single masking step to initially define the P+ isolation regions, N+ sinkers, N-wells, and P-wells results in the self-alignment of these regions. Several critical mask alignments are thereby eliminated, thus avoiding/simplifying fabrication steps, conserving die area, and allowing increased component density.