The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1996
Filed:
Feb. 02, 1994
Takahiro Itakura, Kariya, JP;
Nippondenso Co., Ltd., Kariya, JP;
Abstract
An inspection device and method that closely approximates a visual inspection technique for evaluating the quality of a sample. A mask image generation section generates a master image from an image signal of a known good sample. The image signal is used to a first mask image. A plurality of second mask images are generated by magnifying a pattern area of the first mask image by different magnification ratios. A discrimination surface area threshold is set for each mask image. An image under inspection generation section generates a binary image of an unknown sample. A discrimination section takes the logical AND of the binary images of the unknown sample and each mask image, calculates surface areas of pinhole flaws existing in a background area of the binary image under inspection, compares the calculated surface areas and the threshold corresponding to the mask images, and performs a pass/fail judgement of the unknown sample based on the result of this comparison.