The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1996
Filed:
Aug. 17, 1993
Frank Hermann, Siegen, DE;
Leica Mikroskopie und Systeme GmbH, Wetzlar, DE;
Abstract
In photographic recordings made by fluorescence microscopy, it is possible for a bleaching out of the preparation to occur, associated with a loss of fluorescence intensity. This so-called 'fading' demands an exposure time correction. Where there is a decrease of the light intensity which obeys a known function, exposure takes place over a first exposure time T.sub.1 derived from the light intensity I.sub.1 measured prior to the exposure. The exposure process is then interrupted, and a further intensity I.sub.2 is measured. Then, if required, exposure takes place over a further exposure time T.sub.2, computed from I.sub.1, I.sub.2 and T.sub.1. In this way, in each instance, all of the light of the photographic beam path passes both to the sensor for measurement for measuring intensities and also to the film for exposure. To deflect the photographic beam path, a rotatable mirror is disposed in the beam path, which mirror is controllable by means of a central processor, in the same manner as a shutter. An apparatus for carrying out this photographic process is described.