The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1996
Filed:
Jul. 28, 1994
Hiroaki Kotaka, Nagoya, JP;
Nobuhisa Kurono, Chita-gun, JP;
Hidenori Yamaoka, Nagoya, JP;
Yoshirou Aiba, Zama, JP;
Shuuitsu Matsuo, Atsugi, JP;
Toshiba Ceramics Co., Ltd., Tokyo, JP;
Abstract
Quartz material is subjected to a heat contact treatment with ammonia gas at 1200.degree. C. less under the presence of a carbon generating source to form a silicon oxynitride layer on the surface of the quartz material easily and rapidly. The obtained surface-treated quartz material has excellent heat resistance, and no exfoliation of the silicon oxynitride layer from the quartz material occurs even when it is subjected to a repetitive heat cycle. Further, if a second surface treatment step of coating a silicon nitride film on the silicon oxynitride layer using a CVD method or the like is performed after the surface treatment step of forming the silicon oxynitride layer on the surface of the quartz material, the heat resistance is more improved.