The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1996
Filed:
Jun. 06, 1995
William A Enichen, Poughkeepsie, NY (US);
International Business Machines, Armonk, NY (US);
Abstract
An exposure mask for a particle beam projection system used in the manufacture of semiconductors includes pseudo-random mask alignment marks positioned on the exposure mask that match up with corresponding pseudo-random substrate alignment marks. The substrate alignment marks are made up of three repetitions of the pseudo-random code in the mask alignment marks formed as features on the substrate. The alignment marks act together to produce a backscattered alignment signal with an arbitrarily large capture distance, a single peak on a uniform background that makes it easy to detect the aligned position, a high signal to noise ratio and no false peaks that might lead to misalignment.