The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1996
Filed:
Apr. 13, 1995
Anthony J DeNicola, Jr, New Castle County, DE (US);
John W Mayfield, New Castle County, DE (US);
Thomas F McLaughlin, New Castle County, DE (US);
James R Beren, Chester County, DE (US);
Montell North America Inc., Wilmington, DE (US);
Abstract
A normally solid, high molecular weight, gel-free, irradiated ethylene polymer is characterized by high melt strength due to strain hardening elongational viscosity, which is believed to be caused by free-end long chain branching of the molecular chains forming the polymer. The polymer is prepared by (1) irradiating a normally solid, high molecular weight ethylene polymer without strain hardening elongational viscosity while in the solid state in an environment in which the active oxygen concentration is less than 15% by volume, maintaining the irradiated material in this environment while in the solid state for a specific period of time, and then deactivating free radicals present in the material.