The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 1996
Filed:
Sep. 05, 1995
Ljubisa Ristic, Paradise Valley, AZ (US);
Frank A Shemansky, Jr, Phoenix, AZ (US);
Motorola Inc., Schaumburg, IL (US);
Abstract
A method for fabricating a monolithic semiconductor device with integrated surface micromachined structures is provided. A semiconductor substrate (10) has an interconnection layer (14) and a first sacrificial layer (16) overlying the substrate (10). Sensor areas (30) and IC areas (40) are formed by patterning the first sacrificial layer (16). A patterned sensor structural layer (32) is formed within sensor area (30) and protected by second sacrificial layer (34) and seal layer (36) while IC elements are formed in IC area (40). Subsequent to IC processing a RTA anneal is performed to relieve stress in sensor layer (32). Sensor area (30) is electrically coupled to IC area (40) and sacrificial layers (16, 34) removed to free sensor elements in sensor areas (40).