The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 1996
Filed:
May. 11, 1995
Yoichi Tomo, Kanagawa, JP;
Masao Saito, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A new photoresist composition suited for fine processing is provided which has practical applications in various dry etching processes. An advantageous pattern formation method using such a photoresist composition is also provided. The photoresist composition (1) includes a substance containing a skeleton as at least a part of the main chain. The skeleton is obtained through polymerization of a vinyl alcohol-type compound such as a polyvinyl alcohol chain, at least some hydroxyl groups in the skeleton being protected by protective groups capable of being released by an acid. The skeleton preferably contains a group for improving the dry etching resistance. The photoresistive composition also includes an optical acid generator. Development with a high polarity solvent, for instance aqueous development, is provided. A positive pattern is obtained by aqueous development and a negative pattern is obtained by alcohol development.