The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 1996
Filed:
Oct. 18, 1994
Kiyokazu Tohma, Hirakata, JP;
Kazunari Yoshimoto, Neyagawa, JP;
Ryuji Sugita, Hirakata, JP;
Tatsuaki Ishida, Sakai, JP;
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Abstract
In a manufacturing method of a magnetic recording medium with a vacuum deposition, two shielding members are provided above a substrate for defining an aperture. An evaporation source is located at a position wherein evaporated atoms from an evaporation material can adhere to a moving substrate through the aperture. The substrate is moved while a material in the evaporation source is irradiated at two evaporation portions with two electron beams along a moving direction of the substrate to form a magnetic layer. Thus, curving of columnar gains formed in the magnetic layer is suppressed or crystal orientation is enhanced, and magnetic read/write characteristics are improved. Further, a productivity is improved because the aperture can be enlarged than previously by using the two evaporation portions.