The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1996
Filed:
Apr. 18, 1995
Shigeki Miyazaki, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A plasma addressing electro-optical device including a first substrate having a major surface: a plurality of first electrodes formed on the major surface of the first substrate so as to extend in substantially parallel relationship to each other; a second substrate having a major surface opposed to the major surface of the first substrate; a plurality of second electrodes formed on the major surface of the second substrate so as to extend in substantially parallel relationship to each other to generate plasma addressing between adjacent ones of the second electrodes; an electro-optical material layer formed between the first substrate and the second substrate; and a plasma discharge chamber formed between the electro-optical material layer and the second substrate so as to seal an ionizable gas therein. The plasma discharge chamber has a height of about 75% or more of a distance between the adjacent ones of the second electrodes. According to the setting of the height of the plasma discharge chamber in relation to the distance between the adjacent second electrodes, stable and uniform plasma discharge in the plasma discharge chamber can be realized.