The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1996
Filed:
Sep. 09, 1994
Applicant:
Inventor:
Hisashi Watanabe, Kyoto, JP;
Assignee:
Matsushita Electronics Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03F / ;
U.S. Cl.
CPC ...
430176 ; 430192 ; 430313 ; 430916 ; 4302701 ; 522172 ;
Abstract
The present invention provides a composition having sensitivity to light or radiation. The composition comprises a polymer having a siloxane-bond structure which undergoes polymerization reaction when irridiated with light or radiation, and a sensitizing agent. The present invention also provides a process for forming a pattern, preparing a photomask and a semiconductor device by using the composition of the present invention.
Quick Actions:
Watanabe, Hisashi. (1996). Resist composition having a siloxane-bond structure (U.S. Patent No. 5547808). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5547808
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile