The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 1996
Filed:
Dec. 05, 1994
Gary R Thornberg, Colorado Springs, CO (US);
AT&T Global Information Solutions Company (aka NCR Corporation), Dayton, OH (US);
Hyundai Electronics America, Milpitas, CA (US);
Symbios Logic Inc., Fort Collins, CO (US);
Abstract
A process for coating a surface of a substrate with a polymer material. The process includes heating a polymer to a preselected temperature such that the polymer, if solid, is in a liquid state or if liquid in a less viscous state to form a polymer solution. The polymer solution may contain other components such as a carrier in addition to the polymer. The polymer solution is heated to a preselected temperature below the flashpoint temperature of the polymer solution. The polymer solution is held in reservoir and propelled through a nozzle to create a continuous flow of polymer solution in the form of a stationary wave. The polymer solution flowing out of the nozzle returns to the reservoir, wherein it again will be sent through the nozzle. A substrate having a lower surface is moved over the stationary wave at a preselected rate such that the lower surface of the substrate contacts the stationary wave. A uniform film of polymer is coated on the lower surface of the substrate after the substrate has been moved over and passed the stationary wave.