The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 1996
Filed:
May. 27, 1993
Applicant:
Inventors:
Young C Bae, Pleasanton, CA (US);
David S Soane, Piedmont, CA (US);
Charles Crocker, San Francisco, CA (US);
Assignee:
Soane Technologies, Inc., Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ; B29C / ;
U.S. Cl.
CPC ...
264401 ; 118423 ; 118620 ; 2504 / ; 4751744 ; 427595 ; 4302701 ; 264308 ;
Abstract
Methods and apparatus are disclosed for the production of high precision large scale, micro and mini structures using three dimensional stereolithography. The objects formed using these methods have minimal stress between layers and low curl distortion. The objects also have low warpage because no post-cure treatment is necessary. The methods include the use of elevated pressure, elevated temperature, or sequential polymerization of polymer precursor fluid, or a combination of these, in the three dimensional stereolithographic process.