The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1996
Filed:
Mar. 09, 1994
Brenda C Nke-Aka, Winchendon, MA (US);
Richard Delaney, Lunenburg, MA (US);
Novacor Chemicals (International) SA, Fribourg, CH;
Abstract
High impact polystyrene (HIPS) and other impact modified styrenic polymers such as ABS and MBS tend to suffer from environmental stress cracking. On extended exposure to oily or fatty substances the plastic tends to craze, then crack and finally break. Unfortunately, a number of applications for impact modified polymers is in areas where there is a high potential to contact with oily or fatty substances. The environmental stress crack resistance (ESCR) of impact modified styrenic polymers may be increased by increasing the particle size of the impact modifier and including a low molecular weight polybutene.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile