The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1996
Filed:
Nov. 28, 1994
Applicant:
Inventor:
Jean Jimenez, Voiron, FR;
Assignee:
SGS-Thomson Microelectronics S.A., Saint-Genis, FR;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437195 ; 437187 ; 437246 ; 437984 ;
Abstract
A method for forming a first metal region of a first thickness, and a second metal region of a second thickness on a substrate, wherein the second thickness is greater than the first thickness. The method includes the steps of depositing a first metal layer of a first thickness; depositing a masking layer of a material selectively etchable with respect to the first metal layers; photoetching the masking layer along an outline defining a first metal regions; depositing a second metal layer; forming a resist layer along an outline defining a second metal region; and etching the first and second metal layers.