The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1996
Filed:
Sep. 28, 1994
Vidamed, Inc., Menlo Park, CA (US);
Abstract
A dual-channel RF power delivery system for applying RF energy to dual electrodes of an RF ablation device with independent control of the power level, frequency, phase, and time duration of the RF energy applied to each electrode to more accurately control the ablation of a target tissue. The power delivery system supplies a first controlled RF signal having a first power level, frequency, phase, and time duration to the electrode of a first flexible stylet and a second controlled RF signal having a second power level frequency, phase, and time duration to the electrode of a second flexible stylet. The difference between the first and second power levels and the temperature of the tissue between the first and second stylers are monitored to control the ablation of the target tissue. The supply of the first RF signal is terminated when the monitored temperature of the first stylet exceeds a first predetermined value and the supply of the second RF signal is terminated when the monitored temperature of the second stylet exceeds a second predetermined value. By adjusting the frequency and/or phase of the first and second RF signals, the relative amounts of bipolar and monopolar ablation can be adjusted for accurate control of the lesion volume. The lesion volume can also be controlled by varying the deployment length of the electrodes.