The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 1996
Filed:
Mar. 29, 1995
Kouichi Tamura, Chiba, JP;
Seiko Instruments Inc., Chiba, JP;
Abstract
A method for analyzing a micro area in a micro area X-ray analyzing device which detects X-rays from a sample irradiated by a primary beam and analyzes the sample by analyzing spectra of the X-rays, which method includes selecting a combination of a plurality of stage positions in which an overlapped area of a plurality of primary beam spots nearly conforms with a predetermined analytical area, and calculating a common element of X-ray spectra acquired in the plural stage positions to obtain information on the predetermined analytical area and a background of the sample.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile