The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1996
Filed:
Nov. 09, 1993
Applicant:
Inventors:
James J Appel, Rochester, NY (US);
Susan E Dunn, Rochester, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J / ;
U.S. Cl.
CPC ...
347134 ; 347259 ;
Abstract
In an overfilled polygon ROS architecture, fast scan jitter is reduced by uniformly illuminating the overfilled facets. In one embodiment, the collimator lens is designed with a long focal length to transmit only the more uniform central portion of the Gaussian shaped intensity profile output of a laser diode. In another embodiment, the light level at the polygon facet is made uniform by introducing a variable transmission filter along the optical path.
Appel, James. (1996). Jitter reduction in an overfilled raster output polygon scanner system (U.S. Patent No. 5539441). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5539441
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile