The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1996
Filed:
Nov. 17, 1994
Applicant:
Inventor:
Kazuya Kamon, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430321 ; 430322 ; 430396 ;
Abstract
A reflection photomask includes a substrate having a surface; and a first reflection circuit pattern and a second reflection circuit pattern on the surface of the substrate so that light reflected from the first reflection circuit pattern is different in phase from light reflected from the second reflection circuit pattern.
Quick Actions:
Kamon, Kazuya. (1996). Reflection photomask (U.S. Patent No. 5538818). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5538818
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