The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1996
Filed:
Feb. 27, 1995
Applicant:
Inventors:
Ingo Pinnau, Palo Alto, CA (US);
Kaaeid A Lokhandwala, Menlo Park, CA (US);
Phuong Nguyen, Fremont, CA (US);
Lora G Toy, San Francisco, CA (US);
Marc L Jacobs, Berkeley, CA (US);
Assignee:
Membrane Technology and Research, Inc., Menlo Park, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
95 41 ; 95 42 ; 95 48 ; 95117 ; 95230 ;
Abstract
A membrane process for separating chlorine from chlorine-containing gas streams is disclosed. The process employs a permselective membrane that is selective to chlorine and is stable in the long-term presence of chlorine. The process can be used to treat tail-gas from chlor-alkali plants, for example.
Pinnau, Ingo. (1996). Membrane process for treatment of chlorine-containing gas streams (U.S. Patent No. 5538535). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5538535
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile