The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 1996

Filed:

May. 25, 1994
Applicant:
Inventors:

Lothar Reh, Zumikon, CH;

Marc Tesch, Forch, CH;

Beat Hani, Zuzwil, CH;

Arthur Ruf, Schwerzenbach, CH;

Thomas Meili, Zurich, CH;

Frank Goedicke, Niederhelfenschwil, CH;

Assignee:

Buhler AG, Uzwil, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B67D / ;
U.S. Cl.
CPC ...
222 63 ; 222195 ; 406 30 ; 366101 ; 366107 ;
Abstract

A dosing apparatus provides for dosing a particulate phase within a free flowing two phase flow of a gas phase and the particulate phase, wherein the two phase flow leaves a fluidized bed. The apparatus includes, at its bottom, a gas inlet mechanism to supply the gas via an orifice, and an outlet orifice with a discharge pipe. Control of the gas flow to maintain a predetermined level of the bed is attained by weighing the contents of the bed or by use of sensors within a treatment space of the apparatus. Widening mechanism may be located subsequent to the outlet orifice for widening the stream of particulate phase for exposing an enlarged surface area of particles for treatment.


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