The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1996
Filed:
Sep. 07, 1995
Dirk-Stefan Reichert, Lubeck, DE;
Gotz Kullik, Lubeck, DE;
Wolfgang Falb, Krummesse, DE;
Eckhard Schmudde, Pansdorf, DE;
Thorsten Haase, Ratzeburg, DE;
Dragerwerk AG, Lubeck, DE;
Abstract
A gas ratio control device for anesthesia apparatus, includes an anesthetic gas feed line, which has, in a series-connected arrangement, a control valve with an inlet chamber, an anesthetic gas-adjusting valve and a first measuring resistance, and an oxygen feed line, which has a second measuring resistance, wherein the dynamic pressure received from the measuring resistances is sent to a proportional element, which controls the control valve. A flow-proportional addition of the anesthetic gas is possible even at low oxygen flow rates. This is achieved by the outlet chamber and the first pressure chamber being connected to one another in one piece in terms of flow. The anesthetic gas-adjusting valve is arranged in front of the inlet chamber of the control valve in terms of flow. A flow resistance is provided between two chambers limited by diaphragms of the proportional element.