The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 1996
Filed:
Mar. 23, 1995
Tomoko Ohtagaki, Kyoto, JP;
Yoshikazu Sano, Osaka, JP;
Matsushita Electronics Corporation, Osaka, JP;
Abstract
The method of manufacturing a solid state imaging device of the invention comprises a step of adding carboxylate as a dyeing assistant auxiliary to the aqueous dyestuff solution when forming dyeing layers of acrylic-based resin on a semiconductor substrate on which a solid state imaging element is formed. Therefore this invention provides a solid state imaging device with a color filter which is dyed densely, is flat, thin, and excellent in spectral characteristics. A transparent planarization resin layer (the material is e.g. acrylic) is formed on a semiconductor substrate, and a shading layer and planarization resin layer are successively formed thereon. A synthetic resin is prepared and added photosensitizer of diazo compound. On the above-mentioned planarization resin layer, the layer of the synthetic resin is coated to be 0.2 to 0.8 .mu.m thick, for example, by a spin coat method. Then the synthetic resin is selectively exposed with a stepper, and developed to form patterns of a color filter. Then, the resin with the pattern is dyed to be a cyan layer. In the step, ammonium acetate and a urea compound are added to the aqueous dyestuff solution.