The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 1996
Filed:
Dec. 14, 1994
Applicant:
Inventor:
Charles A Gaston, Lancaster, PA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
25049222 ; 378 34 ;
Abstract
In electron beam lithography, formation of micron and submicron size features is complicated by undesired nonuniform (pattern-density dependent) resist exposure from electrons backscattered from the underlying substrate. The disclosed technique uses a combination of a scattering mask and a scattering filter to add a leveling background exposure automatically and thus provide uniform contrast across the entire exposure pattern.