The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 1996
Filed:
Mar. 08, 1995
Shinji Mizutani, Kanagawa-ken, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Three layer patterns are formed on a shot area, and wafer marks for X axis and wafer marks for Y axis are formed in each of the first to third layers. When a reticle pattern to be exposed has a certain relationship with the first and second layer patterns, an alignment reference coordinate value is determined on the basis of coordinate values of the wafer marks in the first and second layers. Alignment between a predetermined shot area and a reticle pattern is performed on the basis of the alignment reference coordinate value. The alignment reference coordinate value can be determined on the basis of an average value or a weighted mean value of the coordinate values of the wafer marks.