The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 1996
Filed:
Feb. 03, 1995
Pierre Fayet, Lausanne, CH;
Bertrand Jaccoud, Siviriez, CH;
Tetra Laval Holdings & Finance SA, Pully, CH;
Abstract
A method of producing an interiorly sterile package possessing superior barrier properties, in which method a package is produced by blow moulding by means of gaseous blow moulding medium, whereafter the blow-moulded package is provided on its inner walls with a coating of a silicon compound by vacuum deposition, the coating acting as a barrier. According to one preferred embodiment of the method, the vacuum deposition is carried out in accordance with conventional chemical plasma deposition by means of a process gas which is identical with the gaseous blow moulding medium employed in the blow moulding operation. As gaseous blow moulding medium and process gas, respectively, use is made of a gas mixture containing oxygen gas and vaporized organic silicon compound, the mixing ratio between the gas components being controlled in such a manner that the coating which is formed in the chemical plasma deposition process consists of a silicon oxide of the general chemical formula SiO.sub.x, where x may vary from between 1,8 and 2,2. The chemical plasma deposition is discontinued when the produced coating has achieved a thickness of less than 2000 .ANG..