The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 1996
Filed:
Jul. 27, 1994
Applicant:
Inventors:
William P Debley, North Hills, CA (US);
John G Larson, Tarzana, CA (US);
Assignee:
Litton Systems, Inc., Woodland Hills, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419234 ; 20419211 ; 20429804 ; 20429836 ;
Abstract
The invention uses an ion beam to polish a rotatable substrate from an oblique angle between the horizontal and the center line of the gun to the substrate to upgrade the quality of substrates. Alternatively, the substrates are left in the high vacuum chamber without breaking the vacuum for in-situ deposition of thin films thereby avoiding contamination, and to provide premium optics. A wobble stick arrangement is provided to align the ellipsometer reflected beam with the ellipsometer detector during operation without breaking the vacuum which, if broken, would admit contamination.