The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 1996

Filed:

May. 15, 1995
Applicant:
Inventors:

Ken Ueki, Tokyo, JP;

Takeo Shimizu, Tokyo, JP;

Isao Ohyama, Tokyo, JP;

Shiro Nakamura, Tokyo, JP;

Hisaharu Yanagawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B / ;
U.S. Cl.
CPC ...
65377 ; 65386 ; 65608 ; 356401 ; 437924 ; 148D / ;
Abstract

The present invention provides a method of manufacturing an optical component, having the steps of forming a first position aligning pattern on a surface of a substrate, forming a second position aligning recess-projection pattern conforming with the first position aligning pattern and a third position aligning recess-projection pattern having a predetermined positional relationship with the second position aligning recess-projection pattern, and applying a predetermined processing with the third position aligning recess-projection pattern used as a reference under a predetermined positional relationship with the first position aligning pattern.


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