The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 1996

Filed:

Mar. 09, 1995
Applicant:
Inventors:

Michael P Challenger, Bothell, WA (US);

Arthur S Valla, Bothell, WA (US);

Assignee:

STI Optronics, Inc., Bellevue, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F / ;
U.S. Cl.
CPC ...
335298 ; 335212 ; 335306 ;
Abstract

A method and apparatus for independently adjusting the spacing between opposing magnet arrays in charged particle based light sources. Adjustment mechanisms between each of the magnet arrays and the supporting structure allow the gap between the two magnet arrays to be independently adjusted. In addition, spherical bearings in the linkages to the magnet arrays permit the transverse angular orientation of the magnet arrays to also be adjusted. The opposing magnet arrays can be supported above the ground by the structural support.


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