The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1996
Filed:
Oct. 21, 1994
Yo H Koh, Kyoungkido, KR;
Chan K Park, Kyoungkido, KR;
Seong M Hwang, Kyoungkido, KR;
Kwang M Rho, Kyoungkido, KR;
Hyundai Electronics Industries Co., Ltd., Kyoungkido, KR;
Abstract
There is disclosed a method for forming a contact in a semiconductor device wherein a contact material is contacted with an area of a first conductive film between second conductive film patterns which are insulated with the first conductive film and closely adjacent to each other. The method comprises the steps of contacting with the first conductive film a first contact mediator passing by the second conductive film patterns, in a self-alignment manner, contacting a second contact mediator with a predetermined area of the first contact mediator, forming a conductive film spacer at a side wall of the second contact mediator with the contact mediator being patterned, and forming the contact material on the contact mediator.