The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1996
Filed:
Sep. 12, 1994
Applicant:
Inventors:
Kazumasa Doi, Kawasaki, JP;
Kazuhiko Sumi, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430296 ; 430322 ; 430323 ; 430394 ;
Abstract
A method for manufacturing a phase shift mask of the invention comprises a process of protecting a side wall of an opening in a light-damping film by means of a resist and then etching the light-damping film to be so thin as a halftone film.