The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1996
Filed:
Jul. 12, 1995
Ashish Sen, Midland, MI (US);
Yoshihiko Teramoto, Ohtsu, JP;
The Dow Chemical Company, Midland, MI (US);
Abstract
Described is a continuous process for removing polyphosphoric acid from a polybenzazole dope filament, which comprises: (a) contacting the dope filament with water or a mixture of water and polyphosphoric acid under conditions sufficient to reduce the phosphorous content of the filament to less than about 10,000 ppm by weight; and then (b) contacting the dope filament with an aqueous solution of an inorganic base under conditions sufficient to convert at least about 50 percent of the polyphosphoric acid groups present in the filament to a salt of the base and the acid. It has been discovered that contacting the dope filament with a solution of a base after washing the filament to remove most of the residual phosphorous advantageously leads to an improvement in the initial tensile strength of the filament, as well as improved retention of tensile strength and/or molecular weight (of the polybenzazole polymer) following exposure to light and/or high temperatures.