The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1996
Filed:
Sep. 02, 1994
Tsuyoshi Takizawa, Shizuoka, JP;
Tomoegawa Paper Co., Ltd., Tokyo, JP;
Abstract
A desensitizing solution for lithographic platemaking which mainly comprises phytic acid or a salt thereof is disclosed, said desensitizing solution containing a polyether polyamine or a derivative thereof represented by formula (I): ##STR1## wherein k, m, x, and y each represent an integer of 1 or more; and R.sub.1 represents a hydrogen atom or C.sub.n H.sub.2n R.sub.2, wherein n is an integer of 1 or more, and R.sub.2 represents a hydrogen atom, an NR.sub.3 R.sub.4 (wherein R.sub.3 and R.sub.4 each represent a hydrogen atom or an alkyl group), a chlorine atom, a fluorine atom, an iodine atom, a bromine atom, a hydroxyl group, a carboxyl group or a carbamoyl group, or a polyamine derivative represented by formula (II): ##STR2## wherein X represents a halogen atom; p and each represent an integer of from 2 to 6; and r represents an integer of from 3 to 2000. The desensitizing solution exhibits satisfactory desensitizing characteristics without causing environmental pollution.