The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1996
Filed:
May. 30, 1995
Anthony T Ward, Webster, NY (US);
Donald J Teney, Rochester, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
There is disclosed a method for forming a photosensitive imaging member to be subjected to light of a specific wavelength comprising: depositing a charge generating layer on a substrate, depositing a charge transport layer on the charge generating layer, wherein there is variation in the thickness of the transport layer, and controlling during the deposition of the charge generating layer the thickness of the generating layer as a way to substantially suppress the optical interference effects at the wavelength of illumination due to the variation in the thickness of the transport layer, wherein the thickness of the generating layer is controlled to enable the imaging member to exhibit an optical absorption modulation which is effective for substantially suppressing the optical interference effects.