The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 1996
Filed:
Nov. 15, 1994
Takashi Goto, Ushiku, JP;
Sanyo Electric Co., Ltd., Osaka, JP;
Abstract
A method for manufacturing a stencil mask in provided, in which precise patterning and a sufficient thickness of the absorber film are ensured, and manufacturing steps are simplified. Temporary holes 1h are formed on the substrate 1 based on the precise mask pattern of the intermediate film 2. The absorber film 3 is formed on the intermediate film 2, while an extra portion of the absorber film is deposited and stored in the temporary holes 1h. The absorber film 3 is made sufficiently thick while maintaining the precise patterning of the intermediate film 2. A window 6 is formed from the rear surface of the substrate penetrating through the substrate, through which beams pass. The temporary holes 1h and the extra portion of the absorber film are naturally removed during the forming of the window 6.