The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 1996
Filed:
Apr. 06, 1995
Masanori Usui, Aichi-gun, JP;
Takatoshi Kato, Nisshin, JP;
Hiroyuki Kano, Nishikamo-gun, JP;
Tadashi Shibata, Toyokawa, JP;
Nippondenso Co., Ltd., Kariya, JP;
Abstract
A field-effect transistor includes a semi-insulating substrate, a semiconductor layer consisting of successive layers of GaAs compound semiconductor formed on the substrate, a gate electrode forming a Schottky contact with the semiconductor layer, and source and drain electrodes each forming an ohmic contact to the semiconductor layer. A semiconductor layer includes a buffer layer, an active layer, and a contact layer, where the impurity concentration in the contact layer is substantially equal to that in the active layer at the interface therewith. The impurity concentration in the contact layer increases continuously from the interface toward the upper surface of the contact layer. The field-effect transistor achieves a reduction in the ON resistance and an increase in the gate breakdown voltage at the same time, and to reduce power loss and increase efficiency.