The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 1996
Filed:
Aug. 31, 1993
Nobuaki Takahashi, Hachioji, JP;
Tokyo Electron Kabushiki Kaisha, Tokyo, JP;
Abstract
There are provided a treatment chamber for removing natural oxide films formed on the surface and the underside of an object to be treated, e.g., a semiconductor wafer, in treating gas ambient atmosphere, holding member for holding the object to be treated in the treatment chamber, and a mounting member with, e.g., pins erected thereon, and a disk body disposed inside the mounting member. The mounting member and the disk body are rotated relatively to each other. The relative rotation of the mounting member and the disk body generates flows of the treating gas, so that the natural oxide films are homogeneously removed from the entire surface and underside of the object to be treated.