The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 1996
Filed:
Mar. 06, 1995
Applicant:
Inventors:
Peter Hoessel, Schifferstadt, DE;
Gerhard Hoffmann, Otterstadt, DE;
Juergen Langen, Bonn, DE;
Holger Reinecke, Ruelzheim, DE;
Assignee:
BASF Aktiengesellschaft, Ludwigshafen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430326 ; 4302701 ; 430908 ; 430966 ; 430967 ;
Abstract
The invention relates to a process for producing microstructure elements having structure depths of from several .mu.m to the mm region by imagewise irradiation of polymers with X-rays, where the polymers employed are aliphatic polyesters.