The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 1996
Filed:
Oct. 05, 1994
Nobuo Matsumoto, Kanagawa, JP;
Toshihiro Nishikawa, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In a first processing step, whether a first photosensitive material is a particular photosensitive material is detected. If it is detected at least that the first photosensitive material is the particular photosensitive material, processing conditions in the first processing step are recorded in a predetermined position on the first photosensitive material. Exposure conditions in the exposure step are set in accordance with one of the result of the detection and the processing conditions recorded on the first photosensitive material. The second photosensitive material is exposed under the set exposure conditions. If the first photosensitive material is detected to be a particular photosensitive material, the setting of the exposure conditions is changed in the exposure step, and the exposure conditions are set in such a manner as to compensate the difference in the characteristic occurring in the image of the particular first photosensitive material depending on standard processing and particular processing. Accordingly, even in the case of a photosensitive material requiring particular processing, it is possible to form an image of fixed quality.