The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 1996

Filed:

Apr. 08, 1994
Applicant:
Inventors:

Rolf Althaus, Flawil, CH;

Alexander Beeck, Engingen, CH;

Yau-Pin Chyou, Dottikon, CH;

Adnan Eroglu, Untersiggenthal, CH;

Assignee:

ABB Management AG, Baden, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F / ; B01F / ;
U.S. Cl.
CPC ...
3661815 ; 366337 ; 138 37 ;
Abstract

A mixing chamber for introducing a gaseous secondary flow into a gaseous, ducted main flow includes a plurality of vortex generators to facilitate mixing of the flows. The secondary main flow has a substantially smaller mass flow than the main flow. The main flow is guided via the plurality of vortex generators arranged adjacent to one another over the width or the periphery of the duct through which flow takes place. The height (h) of the vortex generators is at least 50% of the height (H) of the duct through which flow takes place. The secondary flow is fed into the duct in the immediate region of tile vortex generators. The mixing chamber according to the invention exhibits extraordinarily short mixing distances in the mixing chamber with a simultaneously low pressure loss.


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