The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1996
Filed:
Aug. 30, 1993
William B Hugle, Costa di Dentro, CH-6614 Brissago, CH;
Rene Dandliker, CH-2000 Neuchatel, CH;
Hans P Herzig, CH-2000 Neuchatel, CH;
Other;
Abstract
Microlithography techniques have provided a means for the development of many useful devices from microcircuits, which made the computer era possible, to micromechanical devices such as motors that are only a few tens of microns across. A new use of a microdevice is presented here which serves to 'payback' the art of microlithography as it is a significant contribution thereto. The device of the invention is a unique microdevice made with advanced microlithography techniques which when completed can be used as a new exposure tool for microlithography. A lens array can be as thin as 1/40 of the thickness of the page that this text is printed on, yet have thereon an arrangement of optical lenses powerful enough to replace very sophisticated and bulky, million dollar precision optics. An array of lenses can be fabricated with binary optical device and other techniques. The array having unlimited area and field of regard can be used as an exposure tool for very large area microdevices such as flat panel displays without the requirement of step and repeat operations which severely limit the throughput and yield in modern manufacturing methods.