The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1996
Filed:
Jun. 03, 1994
Robert W Yanka, Liverpool, NY (US);
Milton L Noble, Liverpool, NY (US);
Martin Marietta Corporation, Syracuse, NY (US);
Abstract
A dual band IR scanning focal plane assembly includes two linear detector arrays in a close spaced configuration monolithically integrated on a common substrate. A medium wave IR staggered element linear array is formed on the front (111)B face of a (111) crystallographically oriented CdZnTe substrate in an MCT layer deposited by the molecular beam epitaxial (MBE) process. A long wave IR staggered element linear array is formed on the back (111)A face of the substrate in an MCT layer deposited by the liquid phase epitaxial (LPE) process. The sets of odd and even rows of the LWIR array on the back face are contiguous, while the sets of odd and even rows of the MWIR array on the front face are close-spaced, the spacing being just wide enough to allow a clear optical path to the underlying linear LWIR array. The arrangement provides simplified spectral separation of the simultaneously readout MWIR and LWIR images.