Methods for making high-density/long-via laminated connectors

Abstract

A high-density laminated connector having a plurality of rigid dielectric layers laminated together is described. The rigid construction of the connector permits precise dimensions of the connector and, thus, accurate attachment of adjacent interconnect substrates. The dielectric layers include traces which have contact pads or bumps formed at the surfaces of the connector for connection to the traces of one or more adjacent interconnect substrates. The contact pads may comprise soft gold, solder, or various elastomeric materials. The use of soft gold contacts enables the connector to be easily removed from an adjacent interconnect substrate. In other embodiments, the rigid dielectric layers may comprise recesses where the contact pads are placed. This ensures physical alignment of the interconnect substrate and the connector, so that dimensional integrity is maintained when pressure is applied to the connector. The traces within the connector can be of a varied width, pitch, and direction. Thus, right-angle interconnections can be made. Cross-traces can be placed on each individual layer of dielectric and vias made through the dielectric layers to interconnect traces. The trace width can be economically and accurately narrowed to produce high aspect ratios and thus provide high signal density.