The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 1996
Filed:
Feb. 15, 1995
Jenoptik Technologie GmbH, Jena, DE;
Abstract
In an irradiation device for deep x-ray lithography the adjustment precision necessary for the irradiation is to be ensured and influences, which act uncontrolled on the adjusted position, substantially eliminated. An object stand is provided which is surrounded by a vacuum chamber, secured to a carrier and is movable with positioning means with respect to a beam and which has a holder suitable not only to receive an article to be irradiated but also to receive an adjusting element. Between the carrier, object stand and positioning means on the one hand and the vacuum chamber on the other hand there is a first isolating, flexible connection and between wall elements, of which one is connected to the carrier and the other is fixed to the frame, there is a second isolating, flexible connection, the surfaces of the two isolating, flexible connections acting against the external air pressure being of the same size. The vacuum chamber and a space defined by the wall elements with the second flexible connection are coupled together for pressure balancing. Such irradiation devices are usable for manufacturing technical microsystem components in accordance with a technology which has become known under the name LIEA process (Lithography with Synchrotron Radiation, Galvano shaping Forming Technology with Plastics).